Solstice® LT Electroplating System

The flexible Solstice^® single-wafer platform offers a broad portfolio of electroplating and surface preparation applications on a single, compact system. Engineered for reliability and uptime, Solstice delivers advanced performance with maximum throughput and wafer uniformity.

Available with up to 3, 4, or 8 chambers, The Solstice platform can accommodate a variety of substrate types, from traditional silicon devices to compound semiconductors and emerging materials like glass. The systems can reliably and expertly process wafers down to 75mm in diameter — whether mounted, thinned, flatted, bowed, or transparent — and can handle multiple wafer sizes on a single system. Wafer rotor changes take less than 5 minutes, minimizing system downtime and contributing to the platform’s ease of operation and maintenance.

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Solstice® LT Electroplating System

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